The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2006
Filed:
Aug. 26, 2004
Joost Jeroen Ottens, Veldhoven, NL;
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Aschwin Lodewijk Hendricus Johannes Van Meer, Roosendaal, NL;
Jan Rein Miedema, Eindhoven, NL;
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Aschwin Lodewijk Hendricus Johannes Van Meer, Roosendaal, NL;
Jan Rein Miedema, Eindhoven, NL;
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and an article support for supporting a substantially flat article to be placed in the beam of radiation. The article support includes a plurality of supporting protrusions for supporting the article, and at least one protective member located near a boundary of the supporting protrusions for protecting at least a boundary portion of the supporting protrusions during release of the article. The apparatus also includes a releasing device for releasing said article from said article support.