The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2006
Filed:
May. 13, 2004
Wilhelmus Josephus Box, Eksel, BE;
Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;
Dominicus Jacobus Petrus Adrianus Franken, Veldhoven, NL;
Martinus Hendrikus Antonius Leenders, Rotterdam, NL;
Erik Roelof Loopstra, Heeze, NL;
Josephus Jacobus Smits, Geldrop, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Wilhelmus Josephus Box, Eksel, BE;
Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;
Dominicus Jacobus Petrus Adrianus Franken, Veldhoven, NL;
Martinus Hendrikus Antonius Leenders, Rotterdam, NL;
Erik Roelof Loopstra, Heeze, NL;
Josephus Jacobus Smits, Geldrop, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors and/or their support. The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields may include heat shields that intercept heat radiation to or from the support and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile