The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2006
Filed:
Apr. 28, 2005
Roger Kroeze, San Francisco, CA (US);
David A. Soltz, San Jose, CA (US);
David A. Crewe, Sunnyvale, CA (US);
Gregory W. Grant, San Jose, CA (US);
Chiyan Kuan, Danville, CA (US);
Thierry H. C. Nguyen, Sunnyvale, CA (US);
Salvatore T. Fahey, Oakland, CA (US);
Edward M. James, San Francisco, CA (US);
Roger Kroeze, San Francisco, CA (US);
David A. Soltz, San Jose, CA (US);
David A. Crewe, Sunnyvale, CA (US);
Gregory W. Grant, San Jose, CA (US);
Chiyan Kuan, Danville, CA (US);
Thierry H. C. Nguyen, Sunnyvale, CA (US);
Salvatore T. Fahey, Oakland, CA (US);
Edward M. James, San Francisco, CA (US);
KLA-Tencor Technologies, Inc., Milpitas, CA (US);
Abstract
A method of measuring properties of a sample using an electron beam. Coordinates of a measurement site on the sample, and a diameter of the electron beam are defined. Multiple measurement locations are determined within the measurement site, using the coordinates of the measurement site and the diameter of the electron beam. The measurement locations are selected such that the electron beam when directed at the multiple measurement locations (either through beam deflection or sample movement) substantially covers the measurement site. The electron beam is directed to the measurement locations and properties of the sample are measured at each of the measurement locations.