The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2006
Filed:
Feb. 12, 2004
Youichi Ohsawa, Niigata-ken, JP;
Katsuhiro Kobayashi, Niigata-ken, JP;
Yoshitaka Yanagi, Niigata-ken, JP;
Kazunori Maeda, Niigata-ken, JP;
Youichi Ohsawa, Niigata-ken, JP;
Katsuhiro Kobayashi, Niigata-ken, JP;
Yoshitaka Yanagi, Niigata-ken, JP;
Kazunori Maeda, Niigata-ken, JP;
Shin-Etsu Chemical Co.,Ltd., Tokyo, JP;
Abstract
A chemical amplification type resist composition comprising a specific sulfonyldiazomethane containing long-chain alkoxyl groups has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.