The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2006

Filed:

Oct. 28, 2003
Applicants:

Seong-ho Kim, Gyeonggi-do, KR;

Dong-gun Park, Gyeonggi-do, KR;

Chang-sub Lee, Gyeonggi-do, KR;

Jeong-dong Choe, Gyeonggi-do, KR;

Sung-min Kim, Incheon Metropolitan, KR;

Shin-ae Lee, Gyeonggi-do, KR;

Inventors:

Seong-Ho Kim, Gyeonggi-do, KR;

Dong-Gun Park, Gyeonggi-do, KR;

Chang-Sub Lee, Gyeonggi-do, KR;

Jeong-Dong Choe, Gyeonggi-do, KR;

Sung-Min Kim, Incheon Metropolitan, KR;

Shin-Ae Lee, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/41 (2006.01);
U.S. Cl.
CPC ...
Abstract

A self-aligned contact structure and a method of forming the same include selected neighboring gate electrodes with adjacent sidewalls that are configured to angle toward each other. The angled surfaces of the gate electrodes can be protected using a liner layer that can extend the length of the contact window to define the sidewalls of the contact window.


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