The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2006

Filed:

Sep. 22, 2004
Applicants:

Michael L. Mcswiney, Scappoose, OR (US);

Huey-chiang Liou, Fremont, CA (US);

Michael D. Goodner, Hillsboro, OR (US);

Robert E. Leet, Scottsdale, AZ (US);

Robert P. Meagley, Hillsboro, OR (US);

Inventors:

Michael L. McSwiney, Scappoose, OR (US);

Huey-Chiang Liou, Fremont, CA (US);

Michael D. Goodner, Hillsboro, OR (US);

Robert E. Leet, Scottsdale, AZ (US);

Robert P. Meagley, Hillsboro, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01L 21/469 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method including introducing a precursor in the presence of a circuit substrate, and forming a film including a reaction product of the precursor on the substrate, wherein the precursor includes a molecule comprising a primary species of the film and a modifier. A method including introducing a precursor in the presence of a circuit substrate, the precursor including a primary species and a film modifier as a single source, and forming a film on the circuit substrate. An apparatus including a semiconductor substrate, and a film on a surface of the semiconductor substrate, the film including a reaction product of a precursor including a molecule comprising a primary species and a modifier.


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