The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2006
Filed:
Jan. 29, 2004
Daniel C. Edelstein, White Plains, NY (US);
Panayotis C. Andricacos, Croton-on-Hudson, NY (US);
John M. Cotte, New Fairfield, CT (US);
Hariklia Deligianni, Tenafly, NJ (US);
John H. Magerlein, Yorktown Heights, NY (US);
Kevin S. Petrarca, Newburgh, NY (US);
Kenneth J. Stein, Sandy Hook, CT (US);
Richard P. Volant, New Fairfield, CT (US);
Daniel C. Edelstein, White Plains, NY (US);
Panayotis C. Andricacos, Croton-on-Hudson, NY (US);
John M. Cotte, New Fairfield, CT (US);
Hariklia Deligianni, Tenafly, NJ (US);
John H. Magerlein, Yorktown Heights, NY (US);
Kevin S. Petrarca, Newburgh, NY (US);
Kenneth J. Stein, Sandy Hook, CT (US);
Richard P. Volant, New Fairfield, CT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An inductor and a method of forming and the inductor, the method including: (a) providing a semiconductor substrate; (b) forming a dielectric layer on a top surface of the substrate; (c) forming a lower trench in the dielectric layer; (d) forming a resist layer on a top surface of the dielectric layer; (e) forming an upper trench in the resist layer, the upper trench aligned to the lower trench, a bottom of the upper trench open to the lower trench; and (f) completely filling the lower trench at least partially filling the upper trench with a conductor in order to form the inductor. The inductor including a top surface, a bottom surface and sidewalls, a lower portion of said inductor extending a fixed distance into a dielectric layer formed on a semiconductor substrate and an upper portion extending above said dielectric layer; and means to electrically contact said inductor.