The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2006
Filed:
Oct. 21, 2004
Yuji Harada, Nakakubiki-gun, JP;
Jun Hatakeyama, Nakakubiki-gun, JP;
Yoshio Kawai, Nakakubiki-gun, JP;
Masaru Sasago, Hirakata, JP;
Masayuki Endo, Izumi, JP;
Shinji Kishimura, Itami, JP;
Kazuhiko Maeda, Chiyoda-ku, JP;
Haruhiko Komoriya, Kawagoe, JP;
Kazuhiro Yamanaka, Kawagoe, JP;
Yuji Harada, Nakakubiki-gun, JP;
Jun Hatakeyama, Nakakubiki-gun, JP;
Yoshio Kawai, Nakakubiki-gun, JP;
Masaru Sasago, Hirakata, JP;
Masayuki Endo, Izumi, JP;
Shinji Kishimura, Itami, JP;
Kazuhiko Maeda, Chiyoda-ku, JP;
Haruhiko Komoriya, Kawagoe, JP;
Kazuhiro Yamanaka, Kawagoe, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Central Glass Co., Ltd., Yamaguchi-ken, JP;
Abstract
A polymer comprising recurring units having a partial structure of formula (1) wherein Ris a single bond or alkylene or fluoroalkylene, Rand Rare H or alkyl or fluoroalkyl, at least one of Rand Rcontains at least one fluorine atom is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance