The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2006
Filed:
May. 24, 2002
Shinji Muto, Nirasaki, JP;
Chihiro Taguchi, Kofu, JP;
Nobuyuki Okayama, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
The susceptor () of a plasma treating device, or the electrostatic chuck () of a substrate table is formed by ceramic thermal spray method. A ceramic spray layer (A) is pore-sealed by methacrylic resin (D). Resin raw material mainly containing methyl methacrylate is applied to and impregnated into the ceramic spray layer and then is cured to thereby fill pores between ceramic particles in the ceramic spray layer with methacrylic resin. Methacrylic resin raw material solution, which does not produce pores at curing, can complete perfect pore sealing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile