The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2006

Filed:

May. 26, 2005
Applicants:

Ming-hsing Kao, Tai-Tung Hsien, TW;

Ching-wen Teng, Tao-Yuan Hsien, TW;

Chin-kun Lin, Kao-Hsiung, TW;

Wee-shiong Tan, Singapore, SG;

Inventors:

Ming-Hsing Kao, Tai-Tung Hsien, TW;

Ching-Wen Teng, Tao-Yuan Hsien, TW;

Chin-Kun Lin, Kao-Hsiung, TW;

Wee-Shiong Tan, Singapore, SG;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A wafer carrier gap washer includes at least one wafer carrier head and at least one nozzle installed on a wafer load/unload mechanism. The wafer carrier head has a flexible membrane and a retaining ring for holding a wafer beneath the wafer carrier head during a CMP process. The nozzle sprays fluid toward a gap between the flexible membrane and the retaining ring so as to wash the gap and remove slurry residues produced in the CMP process.


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