The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2006

Filed:

Jun. 16, 2004
Applicants:

Kenichi Shigetomi, Koshi-Machi, JP;

Nobuyuki Sata, Koshi-Machi, JP;

Toshichika Takei, Kikuyo-Machi, JP;

Masatoshi Kaneda, Koshi-Machi, JP;

Inventors:

Kenichi Shigetomi, Koshi-Machi, JP;

Nobuyuki Sata, Koshi-Machi, JP;

Toshichika Takei, Kikuyo-Machi, JP;

Masatoshi Kaneda, Koshi-Machi, JP;

Assignee:

Tokyo Electron Limited, Tokyo-To, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B 1/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

Immediately after a cold substrate G is placed on a substrate table, a large electric power Pis supplied to a heating elementembedded in the substrate table for a time period Tso that temperature of the substrate table overshoots a target temperature, and thereafter zero or very small electric power Pis supplied to the heating element for a time period Tso that the temperature of the substrate tableis lowered to the target temperature while temperature of the substrate continues to rise up to the target temperature. When both the temperature of the substrate table and of the substrate reaches approximately to the target temperature after the time period Thas elapsed, control of the electric power is entrusted to a PID controller.


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Shigetomi, Kenichi. (2006). Substrate processing apparatus and substrate processing method (U.S. Patent No. 7049553). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7049553

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