The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2006
Filed:
Mar. 17, 2000
Sohaila Shooshtarian, Palo Alto, CA (US);
Narasimha Acharya, Sunnyvale, CA (US);
Mike Elbert, San Jose, CA (US);
Andreas Tillmann, Tomerdingen, DE;
Dieter Zernickel, Amstetten, DE;
Sohaila Shooshtarian, Palo Alto, CA (US);
Narasimha Acharya, Sunnyvale, CA (US);
Mike Elbert, San Jose, CA (US);
Andreas Tillmann, Tomerdingen, DE;
Dieter Zernickel, Amstetten, DE;
Mattson Technology, Inc., Fremont, CA (US);
Abstract
The present invention is directed to an apparatus and process for locally heating and/or cooling of semiconductor wafers in thermal processing chambers. In particular, the apparatus of the present invention includes a device for heating or cooling localized regions of a wafer to control the temperature of such regions during one or more stages of a heat cycle. In one embodiment, gas nozzles eject gas towards the bottom of the wafer to provide localized temperature control. In another embodiment, a transparent gas pipe containing a variety of gas outlets distributes gas onto the top surface of the wafer to provide localized temperature control.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile