The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 2006

Filed:

Mar. 19, 2004
Applicants:

Wen-chin Lin, Hsin-Chu, TW;

Denny Tang, Saratoga, CA (US);

Li-shyue Lai, Jhube, TW;

Chung-long Chang, Dou-Liou, TW;

Chun-hon Chen, Jhubei, TW;

Inventors:

Wen-Chin Lin, Hsin-Chu, TW;

Denny Tang, Saratoga, CA (US);

Li-Shyue Lai, Jhube, TW;

Chung-Long Chang, Dou-Liou, TW;

Chun-Hon Chen, Jhubei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01G 4/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

A capacitor for use within a microelectronic product employs a first capacitor plate layer that includes a first series of horizontally separated and interconnected tines. A capacitor dielectric layer separates the first capacitor plate layer from a second capacitor plate layer. The second capacitor plate layer includes a second series of horizontally separated and interconnected tines horizontally interdigitated with the first series of horizontally separated and interconnected tines. The capacitor is formed employing a self-aligned method and the capacitor dielectric layer is formed in a serpentine shape.


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