The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2006
Filed:
Nov. 02, 2004
Masahiro Watanabe, Yokohama, JP;
Hiroyuki Shinada, Chofu, JP;
Atsuko Takafuji, Tokyo, JP;
Masami Iizuka, Ishioka, JP;
Yasuhiro Gunji, Hitachioota, JP;
Kouichi Hayakawa, Hitachinaka, JP;
Masayoshi Takeda, Hitachinaka, JP;
Masahiro Watanabe, Yokohama, JP;
Hiroyuki Shinada, Chofu, JP;
Atsuko Takafuji, Tokyo, JP;
Masami Iizuka, Ishioka, JP;
Yasuhiro Gunji, Hitachioota, JP;
Kouichi Hayakawa, Hitachinaka, JP;
Masayoshi Takeda, Hitachinaka, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capable of automatically correcting astigmatism and a focal point in a relatively short period of time by finding a plurality of astigmatism correction quantities and a focal point correction quantity in a single operation from a relatively small number of 2 dimensional images. Specific embodiments can perform such automatic focusing while minimizing damages inflicted on subject samples. Embodiments include, among others, a charged particle optical system for carrying out an inspection, a measurement and a fabrication with a relatively high degree of accuracy by using a charged particle beam.