The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2006
Filed:
Oct. 22, 2002
Harald Herchen, Los Altos, CA (US);
Henan Hao, Fremont, CA (US);
Celina M. Esteban, Redwood City, CA (US);
Timothy R. Webb, San Mateo, CA (US);
Son N. Trinh, Cupertino, CA (US);
Harald Herchen, Los Altos, CA (US);
Henan Hao, Fremont, CA (US);
Celina M. Esteban, Redwood City, CA (US);
Timothy R. Webb, San Mateo, CA (US);
Son N. Trinh, Cupertino, CA (US);
Applied Materials, Santa Clara, CA (US);
Abstract
An apparatus for providing an electrical bias to a substrate in a processing system is described. The apparatus generally includes a conductive annular body defining a central opening. The conductive annular body may have a substrate seating surface adapted to receive the substrate and a plurality of scallops formed on a surface opposing the substrate seating surface. A plurality of electrical contacts may be formed on the substrate seating surface opposite the plurality of scallops. The electrical contacts may be adapted to engage a plating surface of the substrate.