Company Filing History:
Years Active: 2006
Title: Celina M Esteban: Innovator in Plating Technology
Introduction
Celina M Esteban is a notable inventor based in Redwood City, CA (US). She has made significant contributions to the field of plating technology, particularly with her innovative approach to controlling plating uniformity. Her work has implications for various applications in the semiconductor industry.
Latest Patents
Celina holds a patent for "Plating uniformity control by contact ring shaping." This invention describes an apparatus designed to provide an electrical bias to a substrate within a processing system. The apparatus features a conductive annular body with a central opening, a substrate seating surface for receiving the substrate, and a series of scallops on the opposing surface. Additionally, it includes multiple electrical contacts on the substrate seating surface, which are intended to engage the plating surface of the substrate. This patent showcases her expertise and innovative thinking in the field.
Career Highlights
Celina is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. Her role involves developing advanced technologies that enhance the efficiency and effectiveness of plating processes. With her background and skills, she has become an integral part of her team.
Collaborations
Some of Celina's coworkers include Harald Herchen and Henan Hao, who contribute to her projects and innovations. Their collaboration fosters a creative environment that drives technological advancements.
Conclusion
Celina M Esteban is a pioneering inventor whose work in plating technology has the potential to influence the semiconductor industry significantly. Her innovative patent and contributions to Applied Materials, Inc. highlight her role as a key player in advancing technology.