The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2006
Filed:
Nov. 14, 2002
Subramanyam A. Iyer, Santa Clara, CA (US);
Justin K. Brask, Portland, OR (US);
Vijayakumar S. Ramachandrarao, Hillsboro, OR (US);
Subramanyam A. Iyer, Santa Clara, CA (US);
Justin K. Brask, Portland, OR (US);
Vijayakumar S. Ramachandrarao, Hillsboro, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Radiant energy may be applied to a photochemically susceptible etching or conditioning solution to enable precise control of the removal of material or alteration of the top surface of a wafer during the fabrication of semiconductor integrated circuits. A particular condition may be detected during the course of photoactivated generation of free radicals or molecular activation to control the further generation of said species by controlling the radiant energy exposure of a wafer.