The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 07, 2006

Filed:

Jan. 20, 2005
Applicants:

Marian Mankos, Palo Alto, CA (US);

Luca Grella, Gilroy, CA (US);

David L. Adler, San Jose, CA (US);

Inventors:

Marian Mankos, Palo Alto, CA (US);

Luca Grella, Gilroy, CA (US);

David L. Adler, San Jose, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

One embodiment disclosed relates to an apparatus for inspecting a substrate using charged particles. The apparatus includes an illumination subsystem, an objective subsystem, a projection subsystem, and a beam separator interconnecting those subsystems. Advantageously, the illumination subsystem includes a tilt deflector configured to controllably tilt the incident beam. The tilt of the incident beam caused by the tilt deflector is magnified prior to the incident beam impinging onto the substrate. This technique allows for achieving large beam tilts at the substrate without lens aberrations caused by introducing tilt at the objective lens and without complications due to using a tiltable stage. Other embodiments are also disclosed.


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