The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2006
Filed:
May. 06, 2002
Kang Sub Yim, Mountain View, CA (US);
Soovo Sen, Sunnyvale, CA (US);
Dian Sugiarto, Sunnyvale, CA (US);
Peter Lee, San Jose, CA (US);
Ellie Yieh, San Jose, CA (US);
Kang Sub Yim, Mountain View, CA (US);
Soovo Sen, Sunnyvale, CA (US);
Dian Sugiarto, Sunnyvale, CA (US);
Peter Lee, San Jose, CA (US);
Ellie Yieh, San Jose, CA (US);
Applied Materials Inc., Santa Clara, CA (US);
Abstract
A showerhead adapted for distributing gases into a process chamber and a method for forming dielectric layers on a substrate are generally provided. In one embodiment, a showerhead for distributing gases in a processing chamber includes an annular body coupled between a disk and a mounting flange. The disk has a plurality of holes formed therethrough. A lip extends from a side of the disk opposite the annular body and away from the mounting flange. The showerhead may be used for the deposition of dielectric materials on a substrate. In one embodiment, silicon nitride and silicon oxide layers are formed on the substrate without removing the substrate from a processing chamber utilizing the showerhead of the present invention.