The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2006
Filed:
Nov. 21, 2001
Applicants:
Coming Chen, Taoyuan Hsien, TW;
Juan-yuan Wu, Hsinchu, TW;
Water Lur, Taipei, TW;
Inventors:
Assignee:
United Microelectronics, Corp., Hsinchu, TW;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/36 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming a partial reverse active mask. A mask pattern comprising a large active region pattern with an original dimension and a small active region pattern is provided. The large active region pattern and the small active region pattern are shrunk until the small active region pattern disappears. The large active region pattern enlarged to a dimension slightly smaller than the original dimension.