The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2006
Filed:
Apr. 15, 2004
Applicants:
Alfred M. Halling, Wenham, MA (US);
Leonard M. Rubin, Peabody, MA (US);
Inventors:
Alfred M. Halling, Wenham, MA (US);
Leonard M. Rubin, Peabody, MA (US);
Assignee:
Axcelis Technologies, Inc., Beverly, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/304 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention includes an angle adjuster that alters the path of an ion beam prior to contacting a target wafer. The path is altered according to a target position on the wafer in one or two dimensions in order to compensate for angle variations inherent in batch ion implantation system. The angle adjuster comprises one or more bending elements that controllably alter the path of the ion beam during ion implantation. As a result, the target wafer can be implanted with a substantially uniform implant angle.