The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2006
Filed:
Mar. 05, 2004
Russell J. Low, Rowley, MA (US);
Joseph C. Olson, Beverly, MA (US);
Curt D. Bergeron, Danvers, MA (US);
Eric R. Cobb, Danvers, MA (US);
Jeffrey A. Burgess, Manchester, MA (US);
Russell J. Low, Rowley, MA (US);
Joseph C. Olson, Beverly, MA (US);
Curt D. Bergeron, Danvers, MA (US);
Eric R. Cobb, Danvers, MA (US);
Jeffrey A. Burgess, Manchester, MA (US);
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Abstract
A cathode system having a cathode element configured to extend through an aperture in a wall of an arc chamber of an ion implanter system. A gas flow through a spacing between the cathode element and the aperture is restricted by a restriction member. A method of ionizing a source gas and a cathode element incorporating the restriction member are also provided.