The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 10, 2006

Filed:

Mar. 05, 2004
Applicants:

Russell J. Low, Rowley, MA (US);

Joseph C. Olson, Beverly, MA (US);

Curt D. Bergeron, Danvers, MA (US);

Eric R. Cobb, Danvers, MA (US);

Jeffrey A. Burgess, Manchester, MA (US);

Inventors:

Russell J. Low, Rowley, MA (US);

Joseph C. Olson, Beverly, MA (US);

Curt D. Bergeron, Danvers, MA (US);

Eric R. Cobb, Danvers, MA (US);

Jeffrey A. Burgess, Manchester, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A cathode system having a cathode element configured to extend through an aperture in a wall of an arc chamber of an ion implanter system. A gas flow through a spacing between the cathode element and the aperture is restricted by a restriction member. A method of ionizing a source gas and a cathode element incorporating the restriction member are also provided.


Find Patent Forward Citations

Low, Russell. (2006). Gas flow restricting cathode system for ion implanter and related method (U.S. Patent No. 6984831). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6984831

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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