The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2006

Filed:

Jun. 09, 2004
Applicants:

Byung J. Choi, Round Rock, TX (US);

Ronald D. Voisin, Austin, TX (US);

Sidlgata V. Sreenivasan, Austin, TX (US);

Michael P. C. Watts, Austin, TX (US);

Daniel Babbs, Austin, TX (US);

Mario J. Meissl, Austin, TX (US);

Hillman Bailey, Dripping Springs, TX (US);

Norman E. Schumaker, Austin, TX (US);

Inventors:

Byung J. Choi, Round Rock, TX (US);

Ronald D. Voisin, Austin, TX (US);

Sidlgata V. Sreenivasan, Austin, TX (US);

Michael P. C. Watts, Austin, TX (US);

Daniel Babbs, Austin, TX (US);

Mario J. Meissl, Austin, TX (US);

Hillman Bailey, Dripping Springs, TX (US);

Norman E. Schumaker, Austin, TX (US);

Assignee:

Molecular Imprints, Inc., Austin, TX (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate.


Find Patent Forward Citations

Loading…