The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2005
Filed:
Dec. 06, 2002
Applicants:
Masanobu Igeta, Nirasaki, JP;
Shintaro Aoyama, Nirasaki, JP;
Hiroshi Shinriki, Nirasaki, JP;
Tsuyoshi Takahashi, Nirasaki, JP;
Inventors:
Masanobu Igeta, Nirasaki, JP;
Shintaro Aoyama, Nirasaki, JP;
Hiroshi Shinriki, Nirasaki, JP;
Tsuyoshi Takahashi, Nirasaki, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L021/8238 ;
U.S. Cl.
CPC ...
Abstract
A method of nitriding an insulation film, includes the steps of forming nitrogen radicals by high-frequency plasma, and causing nitridation in a surface of an insulation film containing therein oxygen, by supplying the nitrogen radicals to the surface of the insulation film.