The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2005
Filed:
Jul. 10, 2002
Mehdi Vaez-iravani, Los Gatos, CA (US);
Stan Stokowski, Danville, CA (US);
Steven Biellak, Sunnyvale, CA (US);
Jamie Sullivan, Sunnyvale, CA (US);
Keith Wells, Santa Cruz, CA (US);
Mehrdad Nikoonahad, Menlo Park, CA (US);
Mehdi Vaez-Iravani, Los Gatos, CA (US);
Stan Stokowski, Danville, CA (US);
Steven Biellak, Sunnyvale, CA (US);
Jamie Sullivan, Sunnyvale, CA (US);
Keith Wells, Santa Cruz, CA (US);
Mehrdad Nikoonahad, Menlo Park, CA (US);
KLA-Tencor Technologies Corp., Milpitas, CA (US);
Abstract
Systems and methods for inspecting a surface of a specimen such as a semiconductor wafer are provided. A system may include an illumination system configured to direct a first beam of light to a surface of the specimen at an oblique angle of incidence and to direct a second beam of light to a surface of the specimen at a substantially normal angle. The system may also include a collection system configured to collect at least a portion of the first and second beams of light returned from the surface of the specimen. In addition, the system may include a detection system. The detection system may be configured to process the collected portions of the first and second beams of light. In this manner, a presence of defects on the specimen may be detected from the collected portions of the first and second beams of light.