The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2005
Filed:
Feb. 11, 2000
Christophe Pierrat, Boise, ID (US);
Nanseng Jeng, Boise, ID (US);
Christophe Pierrat, Boise, ID (US);
Nanseng Jeng, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
Optimizing printing of an image from an alternating phase shifting mask having a phase shift error is accomplished using off-axis illumination. By simulating the image using varying off-axis illumination parameters, optimized parameters are selected to compensate for the phase shift error. Once the off-axis illumination parameters are optimized, the image is shot. In addition, the method of varying off-axis illumination parameters to compensate for a phase shift error permits an alternating phase shifting mask to be shot at two different wavelengths.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile