The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2005
Filed:
Aug. 05, 2003
Chin Hsiang Lin, Nantou, TW;
Chin-wei Liao, Nantou, TW;
Hsueh-hao Shih, Hsinchu, TW;
Kuang-chao Chen, Hsinchu, TW;
Chin Hsiang Lin, Nantou, TW;
Chin-Wei Liao, Nantou, TW;
Hsueh-Hao Shih, Hsinchu, TW;
Kuang-Chao Chen, Hsinchu, TW;
Macronix International Co., Ltd., Hsinchu, TW;
Abstract
A fabrication method for a shallow trench isolation region is described. A part of the trench is filled with a first insulation layer, followed by performing a surface treatment process to form a surface treated layer on the surface of a part of the first insulation layer. The surface treated layer is then removed, followed by forming a second insulation layer on the first insulation layer and filling the trench to form a shallow trench isolation region. Since a part of the trench is first filled with the first insulation layer, followed by removing a portion of the first insulation layer, the aspect ratio of the trench is lower before the filling of the second insulation in the trench. The adverse result, such as, void formation in the shallow trench isolation region due to a high aspect ratio, is thus prevented.