The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2005
Filed:
May. 27, 2003
Ling Chen, Sunnyvale, CA (US);
Vincent W. Ku, San Jose, CA (US);
Hua Chung, San Jose, CA (US);
Christophe Marcadal, Sunnyvale, CA (US);
Seshadri Ganguli, Sunnyvale, CA (US);
Jenny Lin, Saratoga, CA (US);
Dien-yeh Wu, San Jose, CA (US);
Alan Ouye, San Mateo, CA (US);
Mei Chang, Saratoga, CA (US);
Ling Chen, Sunnyvale, CA (US);
Vincent W. Ku, San Jose, CA (US);
Hua Chung, San Jose, CA (US);
Christophe Marcadal, Sunnyvale, CA (US);
Seshadri Ganguli, Sunnyvale, CA (US);
Jenny Lin, Saratoga, CA (US);
Dien-Yeh Wu, San Jose, CA (US);
Alan Ouye, San Mateo, CA (US);
Mei Chang, Saratoga, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A precursor and method for filling a feature in a substrate. The method generally includes depositing a barrier layer, the barrier layer being formed from pentakis(dimethylamido)tantalum having less than about 5 ppm of chlorine. The method additionally may include depositing a seed layer over the barrier layer and depositing a conductive layer over the seed layer. The precursor generally includes pentakis(dimethylamido)tantalum having less than about 5 ppm of chlorine. The precursor is generated in a canister having a surrounding heating element configured to reduce formation of impurities.