The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6894781 B1

PDF
Full Text
Expired
Date of Patent:
May. 17, 2005

Filed:

May. 06, 2003
Applicants:

Lanhua Wei, Fremont, CA (US);

Jon Opsal, Livermore, CA (US);

Allan Rosencwaig, Danville, CA (US);

Inventors:

Lanhua Wei, Fremont, CA (US);

Jon Opsal, Livermore, CA (US);

Allan Rosencwaig, Danville, CA (US);

Assignee:

Therma-Wave, Inc., Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J004/00 ;
U.S. Cl.
CPC ...
Abstract

A method and apparatus are disclosed for accurately and repeatably determining the thickness of a thin film on a substrate. A rotating compensator ellipsometer is used which generates both 2ω and 4ω output signals. The 4ω omega signal is used to provide an indication of the temperature of the sample. This information is used to correct the analysis of the thin film based on the 2ω signal. These two different signals generated by a single device provide independent measurements of temperature and thickness and can be used to accurately analyze a sample whose temperature is unknown.


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Wei, Lanhua. (2005). Monitoring temperature and sample characteristics using a rotating compensator ellipsometer (U.S. Patent No. 6894781). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6894781

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