The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2005
Filed:
Dec. 16, 2002
John M. Cotte, New Fairfield, CT (US);
Catherine Ivers, Hopewell Junction, NY (US);
Kenneth J. Mccullough, Fishkill, NY (US);
Wayne M. Moreau, Wappingers Falls, NY (US);
Robert J. Purtell, Mohegan Lake, NY (US);
John P. Simons, Wappingers Falls, NY (US);
William A. Syverson, Colchester, VT (US);
Charles J. Taft, Wappingers Falls, NY (US);
John M. Cotte, New Fairfield, CT (US);
Catherine Ivers, Hopewell Junction, NY (US);
Kenneth J. McCullough, Fishkill, NY (US);
Wayne M. Moreau, Wappingers Falls, NY (US);
Robert J. Purtell, Mohegan Lake, NY (US);
John P. Simons, Wappingers Falls, NY (US);
William A. Syverson, Colchester, VT (US);
Charles J. Taft, Wappingers Falls, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method and apparatus are provided for removing solid and/or liquid residues from electronic components such as semiconductor wafers utilizing liquid or supercritical carbon dioxide which is solidified on the surface of the wafer and then vaporized and removed from the system. In a preferred embodiment the solidification and vaporizing steps are repeated (cycled) before removal of the COfrom the vessel. The residues are carried away with the vaporized carbon dioxide.