The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2005
Filed:
Mar. 23, 2004
Masaki Hosoda, Kanagawa, JP;
Masato Muraki, Tokyo, JP;
Hiroya Ohta, Kodaira, JP;
Haruo Yoda, Hinode, JP;
Masaki Hosoda, Kanagawa, JP;
Masato Muraki, Tokyo, JP;
Hiroya Ohta, Kodaira, JP;
Haruo Yoda, Hinode, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
An electron beam exposure apparatus which exposes a wafer () by using a plurality of electron beams corrects the positional error of the electron beams by using multi-deflector arrays () capable of independently deflecting the positions of the electron beams, and pattern data to be projected onto the wafer (). More specifically, when each of the electron beams is deflected to a predetermined exposure position on the basis of the pattern data, a static positional error independent of the deflection position is corrected by the multi-deflector arrays (), and a dynamic positional error depending on the deflection position is corrected on the basis of the pattern data.