The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2005
Filed:
Jul. 22, 2002
Jörg Schultz, Aalen, DE;
Johannes Wangler, Königsbronn, DE;
Karl-hein Schuster, Königsbronn, DE;
Udo Dinger, Oberkochen, DE;
Wolfgang Singer, Aalen, DE;
Martin Antoni, Aalen, DE;
Hans-juergen Mann, Oberkochen, DE;
Wilhelm Ulrich, Aalen, DE;
Jörg Schultz, Aalen, DE;
Johannes Wangler, Königsbronn, DE;
Karl-Hein Schuster, Königsbronn, DE;
Udo Dinger, Oberkochen, DE;
Wolfgang Singer, Aalen, DE;
Martin Antoni, Aalen, DE;
Hans-Juergen Mann, Oberkochen, DE;
Wilhelm Ulrich, Aalen, DE;
Carl Zeiss Semiconductor, Oberkochen, DE;
Abstract
A projection exposure apparatus for microlithography using a wavelength≦193 nm, includes (A) a primary light source, (B) an illumination system having (1) an image plane, (2) a plurality of raster elements for receiving light from the primary light source, and (3) a field mirror for receiving the light from the plurality of raster elements and for forming an arc-shaped field having a plurality of field points in the image plane, and (C) a projection objective. The illumination system has a principle ray associated with each of the plurality of field points thus defining a plurality of principle rays. The plurality of principle rays run divergently into the projection objective.