The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2005
Filed:
Jul. 07, 2000
Jianshe Tang, Cupertino, CA (US);
Brian J. Brown, Palo Alto, CA (US);
Charles C. Garretson, Palo Alto, CA (US);
Benjamin A. Bonner, San Mateo, CA (US);
Thomas H. Osterheld, Mountain View, CA (US);
Fred C. Redeker, Fremont, CA (US);
Jianshe Tang, Cupertino, CA (US);
Brian J. Brown, Palo Alto, CA (US);
Charles C. Garretson, Palo Alto, CA (US);
Benjamin A. Bonner, San Mateo, CA (US);
Thomas H. Osterheld, Mountain View, CA (US);
Fred C. Redeker, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a load to a substrate and a retaining ring. The friction coefficient of the lower surface of the flexible membrane is increased to prevent contact between the substrate and the retaining ring, thereby preventing slurry compaction and buildup and substrate deformation caused by such contact.