The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 15, 2005

Filed:

Aug. 15, 2002
Applicants:

Blaine R. Spady, Lincoln, NE (US);

Dan M. Colban, Tracy, CA (US);

Robert S. Kearns, Saratoga, CA (US);

Inventors:

Blaine R. Spady, Lincoln, NE (US);

Dan M. Colban, Tracy, CA (US);

Robert S. Kearns, Saratoga, CA (US);

Assignee:

Nanometrics Incorporated, Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B65G049/07 ;
U.S. Cl.
CPC ...
Abstract

A stage used, e.g., in semiconductor fabrication, includes a two substrate buffer station and a movable chuck. The buffer station, in one embodiment is fixed, i.e., non-movable relative to the stage. In another embodiment, the support elements of the buffer station may move in unison vertically or horizontally. In another embodiment, a pair of the support elements horizontally moves toward another pair of support elements to reduce the necessary horizontal motion of the chuck. For example, an unprocessed substrate is loaded onto the top supporting elements of the buffer station, while processed substrates are unloaded from the bottom supporting element of the buffer station. The movable chuck is used to remove the unprocessed substrates from the buffer station and to place the processed substrates on the buffer station.


Find Patent Forward Citations

Loading…