The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2005
Filed:
Apr. 02, 2002
Bok Hoen Kim, San Jose, CA (US);
Nam Le, San Jose, CA (US);
Martin Seamons, San Jose, CA (US);
Ameeta Madhava, San Francisco, CA (US);
Michael P. Nault, Woodland Park, CO (US);
Thomas Nowak, Cupertino, CA (US);
Tsutomu Tanaka, Santa Clara, CA (US);
Moshe Sarfaty, Cupertino, CA (US);
Bok Hoen Kim, San Jose, CA (US);
Nam Le, San Jose, CA (US);
Martin Seamons, San Jose, CA (US);
Ameeta Madhava, San Francisco, CA (US);
Michael P. Nault, Woodland Park, CO (US);
Thomas Nowak, Cupertino, CA (US);
Tsutomu Tanaka, Santa Clara, CA (US);
Moshe Sarfaty, Cupertino, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
In a substrate processing apparatus, a substrate processing chamber has a substrate support to support a substrate, a gas delivery system to provide an energized cleaning gas to the chamber to clean process residues formed on surfaces in the chamber during processing of the substrate, and an exhaust to exhaust the cleaning gas. A detector monitors a chemiluminescent radiation emitted from about a surface during cleaning of the process residues by the energized cleaning gas and generates a signal in relation to the monitored chemiluminescent radiation. A controller receives the signal and evaluates the signal to determine an endpoint of the cleaning process.