The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2005
Filed:
Jul. 29, 2003
Toshio Kodama, Chiba, JP;
Masakatsu Hasuda, Chiba, JP;
Toshiaki Fujii, Chiba, JP;
Kouji Iwasaki, Chiba, JP;
Yasuhiko Sugiyama, Chiba, JP;
Yasuyuki Takagi, Chiba, JP;
Toshio Kodama, Chiba, JP;
Masakatsu Hasuda, Chiba, JP;
Toshiaki Fujii, Chiba, JP;
Kouji Iwasaki, Chiba, JP;
Yasuhiko Sugiyama, Chiba, JP;
Yasuyuki Takagi, Chiba, JP;
SII Nanotechnology Inc., Chiba, JP;
Abstract
An ion beam processing device has a sample holder for fixing a sample on which a section has been formed by irradiation of a specified focused ion beam from a surface side, and gas ion beam irradiation device for irradiating a gas ion beam to a region of the sample fixing using the holder member that contains the section to remove a damage layer on the section. The gas ion beam from the gas ion beam irradiation device irradiates the section from a rear surface side of the sample at a specified incident angle.