The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2004
Filed:
Feb. 11, 2002
Applicant:
Inventors:
Isaac K. Cherian, Aurora, IL (US);
Phillip Carter, Naperville, IL (US);
Jeffrey P. Chamberlain, Aurora, IL (US);
Kevin Moeggenborg, Naperville, IL (US);
David W. Boldridge, Oswego, IL (US);
Assignee:
Cabot Microelectronics Corporation, Aurora, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 ; C09G 1/04 ; C09G 1/16 ; B24B 1/00 ;
U.S. Cl.
CPC ...
C09G 1/02 ; C09G 1/04 ; C09G 1/16 ; B24B 1/00 ;
Abstract
The invention provides a chemical-mechanical polishing systems, and methods of polishing a substrate using the polishing systems, comprising (a) an abrasive, (b) a liquid carrier, and (c) a positively charged polyelectrolyte with a molecular weight of about 15,000 or more, wherein the abrasive comprises particles that are electrostatically associated with the positively charged electrolyte.