The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2004
Filed:
May. 17, 2002
Charles Augustus Choate, IV, Underhill, VT (US);
Timothy S. Hayes, Hinesburg, VT (US);
Michael Raymond Lunn, Georgia, VT (US);
Paul R. Nisson, Colchester, VT (US);
Dean W. Siegel, Colchester, VT (US);
Michael C. Triplett, Colchester, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The present invention describes a method of forming a thin film on a substrate arranged in a deposition system comprising the step of introducing a pre-determined amount of an impurity in a confined volume in the deposition system. One or more gases are introduced into the deposition system for forming the thin film. The impurity is removed from the confined volume in a gas phase during formation of the thin film. The impurity in the gas phase is incorporated into the thin film.