Colchester, VT, United States of America

Paul R Nisson


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Innovation Through Thin Films: The Patented Work of Paul R. Nisson

Introduction

Paul R. Nisson, an inventor based in Colchester, Vermont, has made significant contributions to the field of materials science through his innovative approach to thin film technology. As an employee of the International Business Machines Corporation (IBM), he has focused on the incorporation of impurities into thin films, aiming to enhance their properties and applications.

Latest Patents

Nisson holds a notable patent titled "Incorporation of an impurity into a thin film." This patent describes a groundbreaking method for forming a thin film on a substrate within a deposition system. The patented process involves introducing a predetermined amount of an impurity into a confined volume during the deposition process. By introducing one or more gases into the system, the impurity can be effectively removed in a gas phase, allowing for its integration into the thin film. This innovation opens new pathways for improving the functionality of thin films in various applications.

Career Highlights

Throughout his career at IBM, Paul R. Nisson has been at the forefront of research and development in thin film technology. His dedication to advancing the industry is evident through his patent, reflecting his commitment to innovation and excellence. Nisson's work has garnered attention in the scientific community for its potential to revolutionize the use of thin films in electronics and materials manufacturing.

Collaborations

Nisson has collaborated with esteemed colleagues such as Charles Augustus Choate, IV, and Timothy S. Hayes. These partnerships have been instrumental in driving research initiatives and enhancing the quality of their projects, ultimately contributing to advancements in their respective fields.

Conclusion

Paul R. Nisson's inventive spirit and pioneering methods have paved the way for new innovations in thin film technology. His patent addresses critical aspects of thin film formation and impurity incorporation, showcasing his expertise and dedication to research. With ongoing collaborations and a strong foundation at IBM, Nisson continues to contribute significantly to the advancements in materials science.

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