The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2004
Filed:
May. 20, 2003
Philip A. Fisher, Foster City, CA (US);
Marina V. Plat, San Jose, CA (US);
Chih-Yuh Yang, San Jose, CA (US);
Christopher F. Lyons, Fremont, CA (US);
Scott A. Bell, San Jose, CA (US);
Douglas J. Bonser, Austin, TX (US);
Lu You, San Jose, CA (US);
Srikanteswara Dakshina-Murthy, Austin, TX (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A method for an integrated circuit includes the use of an amorphous carbon ARC mask. A layer of amorphous carbon material is deposited above a layer of conductive material, and a layer of anti-reflective coating (ARC) material is deposited over the layer of amorphous carbon material. The layer of amorphous carbon material and the layer of ARC material are etched to form a mask comprising an ARC material portion and an amorphous carbon portion. A feature may then be formed in the layer of conductive material by etching the layer of conductive material in accordance with the mask.