The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2004
Filed:
Dec. 19, 2002
Applicant:
Inventors:
Pary Baluswamy, Boise, ID (US);
Richard D. Holscher, Boise, ID (US);
Assignee:
Micron Technology, Inc., Boise, ID (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ; H01L 2/3544 ;
U.S. Cl.
CPC ...
G03F 9/00 ; H01L 2/3544 ;
Abstract
A method of designing an alignment target system to minimize lens aberrations is disclosed. A first layer alignment target's pitch is selected based on the minimum feature size of the circuit. The second layer alignment target's pitch is selected based on the diffraction pattern of the first layer's target and the illumination settings of the second layer. Displacement errors are minimized when the second layer target's 1 diffraction order overlaps the first layer target's 0 diffraction order.