The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2004
Filed:
Mar. 08, 2001
Applicant:
Inventors:
Takanobu Takeda, Nakakubiki-gun, JP;
Osamu Watanabe, Nakakubiki-gun, JP;
Kazuhiro Hirahara, Nakakubiki-gun, JP;
Katsuya Takemura, Nakakubiki-gun, JP;
Wataru Kusaki, Nakakubiki-gun, JP;
Akihiro Seki, Nakakubiki-gun, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 1/73 ; G03F 7/039 ; C08L 3/102 ; C08L 3/308 ; C08L 3/310 ; C08L 2/500 ;
U.S. Cl.
CPC ...
G03C 1/73 ; G03F 7/039 ; C08L 3/102 ; C08L 3/308 ; C08L 3/310 ; C08L 2/500 ;
Abstract
A chemical amplification positive resist composition comprising a polymeric mixture of a polyhydroxystyrene derivative having a Mw of 1000-500,000 and a copolymer of hydroxystyrene and (meth)acrylate having a Mw of 1000-500,000, as a base resin, has improved dry etching resistance, high sensitivity, high resolution, and process adaptability, and is suppressed in the slimming of pattern films after development with aqueous base.