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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6713612 B1

PDFFull Text
Date of Patent:
Mar. 30, 2004

Filed:

May. 01, 2003

Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process

Applicant:
Inventors:

Katsuhiro Kobayashi, Niigata-ken, JP;

Youichi Ohsawa, Niigata-ken, JP;

Koji Hasegawa, Niigata-ken, JP;

Takao Yoshihara, Niigata-ken, JP;

Kazunori Maeda, Niigata-ken, JP;

Toshihiko Fujii, Gunma-ken, JP;

Assignee:

Shin-Etsu Chemical Co., Ltd., Tokyo, JP;

Attorney:

Birch, Stewart, Kolasch & Birch, LLP

Primary Examiner:

Fiona T Powers

Int. Cl.
CPC ...
C07C / ; G03F 7/039 ;
U.S. Cl.
CPC ...
C07C / ; G03F 7/039 ;
Abstract

Sulfonyldiazomethane compounds containing a long-chain alkylcyclohexyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development.

Find Patent Forward Citations

Kobayashi, Katsuhiro. (2004). Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process (U.S. Patent No. 6713612). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6713612

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