The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2004
Filed:
Aug. 31, 2001
Applicant:
Inventors:
Hans Van Der Laan, Veldhoven, NL;
Marcel Dierichs, Venlo, NL;
Hendrikus Robertus Marie Van Greevenbroek, Eindhoven, NL;
Markus Franciscus Antonius Eurlings, Breda, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/772 ; G03B 2/768 ; G03B 2/742 ; G03B 2/752 ;
U.S. Cl.
CPC ...
G03B 2/772 ; G03B 2/768 ; G03B 2/742 ; G03B 2/752 ;
Abstract
A method of operating a lithographic projection apparatus including forming a spot of radiation at the wafer level using a pinhole at reticle level. A sensor is defocused with respect to the spot such that it is spaced apart from the wafer level. The sensor is scanned beneath the spot to measure the angular intensity distribution of radiation at the spot and to determine the intensity distribution at the pupil plane of the projection lens system.