The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 16, 2004

Filed:

Jan. 07, 2003
Applicant:
Inventors:

Jing-Cheng Lin, Chu Tung Zhen, TW;

Cheng-Lin Huang, Taipei, TW;

Winston Shue, Hsinchu, TW;

Mong-Song Liang, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/144 ; H01L 2/348 ;
U.S. Cl.
CPC ...
H01L 2/144 ; H01L 2/348 ;
Abstract

A new method is provided is creating metal interconnect comprising copper. A first embodiment of the invention provides for the application of a doped layer of copper. A second embodiment of the invention provides for the deposition of a silicon nitride layer as an inter-barrier film over surfaces of an opening created in a layer of dielectric followed by removing the layer of silicon nitride from the bottom of the opening followed by depositing a doped copper-alloy seed layer over surfaces of the opening followed by plating a layer of copper over the copper-alloy seed layer.


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