The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2004
Filed:
Dec. 11, 2000
SpeedFam-IPEC Corporation, Chandler, AZ (US);
Abstract
A multiple wafer cleaning apparatus comprising a first module ( ), having a first spaced-apart brush assembly having an inner brush ( ) and an outer brush ( ), each brush having a brush pad ( ) and a platen ( ), and a second module ( ) having a second spaced-apart brush assembly ( ) having an inner brush ( ) and an outer brush ( ), each brush having a brush pad ( ) and a platen ( ), each pair of spaced-apart, opposing, vertically disposed brushes ( ) and ( ) for scrubbing vertically disposed semiconductor wafers ( ), in tanks ( ). The two modularized sets of motorized, rotating, opposed, pancake shaped brushes ( ) and ( ), grip the freely rotating wafers ( ) causing the wafers ( ) to rotate in the same direction as the brushes. The size of the brushes relative to the wafer radius is selected so that at any given instant a first portion of the offset vertically disposed wafers are positioned between the contacts of the brushes while the second remaining portion of the wafers extend outwardly downward from between the brushes. The peripheral second remaining portions of the wafers are supported by the vertical rotating support members ( ). The tanks ( ) can contain a cleaning solution ( ) and a megasonic transducer ( ) allowing the support member ( ) to support the workpiece ( ) in a partially submerged position.