The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2003
Filed:
Sep. 08, 2000
Kazumasa Wakiya, Kanagawa-ken, JP;
Masakazu Kobayashi, Kanagawa-ken, JP;
Tokyo Ohka Kogyo Co., Ltd., Kanagawa-ken, JP;
Abstract
A photoresist stripping solution which comprises (a) a salt of hydrofluoric acid with a base free from metal ions: (b) a water-soluble organic solvent; (c) a basic substance; and (d) water; and a method comprising etching a substrate using a photoresist pattern formed on the substrate as a mask, ashing the photoresist pattern, stripping the ashed photoresist pattern using the photoresist stripping solution as described above, and then rinsing the substrate with water. Thus, there are disclosed a photoresist stripping solution which is excellent not only in stripping away post-ashing residue (modified photoresist films) and post-etching residue (metal deposition) but also in protecting substrates from corrosion in the step of rinsing with water; and a method for stripping photoresists using the same.