The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2003
Filed:
Jan. 30, 2002
Toshiya Yokogawa, Nara, JP;
Makoto Kitabatake, Nara, JP;
Osamu Kusumoto, Nara, JP;
Kunimasa Takahashi, Osaka, JP;
Takeshi Uenoyama, Kyoto, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
P-type active region ; n-type source/drain regions and gate insulating film made of a thermal oxide film; gate electrode source/drain electrodes and are provided over a p-type SiC substrate In the active region p-type heavily doped layers which are thin enough to create a quantum effect, and thick undoped layers are alternately stacked. When carriers flow, scattering of impurity ions in the active region is reduced, and the channel mobility increases. In the OFF state, a depletion layer expands throughout the active region, and the breakdown voltage increases. As a result of reduction in charges trapped in the gate insulating film or near the interface between the gate insulating film and the active region, the channel mobility further increases.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile