The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2003

Filed:

Apr. 30, 2002
Applicant:
Inventors:

Robert J. Falster, Milan, IT;

Joseph C. Holzer, St. Charles, MO (US);

Assignee:

MEMC Electronic Materials, Inc., St. Peters, MO (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 1/514 ;
U.S. Cl.
CPC ...
C30B 1/514 ;
Abstract

The present invention relates to a single crystal silicon, in wafer and ingot form, which contains an axially symmetric region which is free of agglomerated intrinsic point defects. The region extends from a circumferential edge of the wafer or constant diameter region of an ingot, axially inwardly toward a central axis such that the entire wafer, a constant diameter portion of the ingot, or an annular-shaped portion of wafer or ingot is free of agglomerated intrinsic point defects. The present invention further relates to these axially symmetric regions wherein silicon self-interstitials are the predominant intrinsic point detect.


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