The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 2003

Filed:

Nov. 30, 2001
Applicant:
Inventors:

Yuzo Mori, Katano-shi, Osaka, JP;

Mitsuhiko Shirakashi, Kanagawa-ken, JP;

Takayuki Saito, Kanagawa-ken, JP;

Yasushi Toma, Osaka, JP;

Akira Fukunaga, Kanagawa-ken, JP;

Itsuki Kobata, Osaka, JP;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23H 3/00 ; C25D 1/700 ; C25B 1/500 ; C25B 9/00 ; C25F 7/00 ;
U.S. Cl.
CPC ...
B23H 3/00 ; C25D 1/700 ; C25B 1/500 ; C25B 9/00 ; C25F 7/00 ;
Abstract

An anode as a workpiece, and a cathode opposed to the anode with a predetermined spacing are placed in ultrapure water. A catalytic material promoting dissociation of the ultrapure water and having water permeability is disposed between the workpiece and the cathode. A flow of the ultrapure water is formed inside the catalytic material, with a voltage being applied between the workpiece and the cathode, to decompose water molecules in the ultrapure water into hydrogen ions and hydroxide ions, and supply the resulting hydroxide ions to a surface of the workpiece, thereby performing removal processing of or oxide film formation on the workpiece through a chemical dissolution reaction or an oxidation reaction mediated by the hydroxide ions. Thus, clean processing can be performed by use of hydroxide ions in ultrapure water, with no impurities left behind on the processed surface of the workpiece.


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